Despite its advantages, EUV lithography faces several challenges:
EUV Light Generation: Generating a stable and powerful EUV light source is complex and requires significant energy. Optical Components: The mirrors and lenses used in EUV systems must be highly precise and free of defects to avoid scattering the light. Photoresist Sensitivity: Developing photoresists that are sensitive enough to EUV light while maintaining resolution and line-edge roughness is challenging. Cost and Complexity: The infrastructure and equipment required for EUV lithography are expensive and complex, posing barriers to widespread adoption.
