What are the Challenges in Achieving High Etching Selectivity?
Several challenges can affect the achievement of high etching selectivity:
Material Compatibility: The chemical and physical properties of the materials involved must be compatible with the chosen etching process. Process Control: Precise control over etching parameters is required to maintain selectivity, which can be difficult to achieve consistently. Etch Residues: Unwanted residues from the etching process can affect both the selectivity and the quality of the etched structures. Aspect Ratio: High aspect ratio structures can present challenges in achieving uniform etching, which can compromise selectivity.
