What are the Challenges in 3nm Process Technology?
One of the primary challenges in developing 3nm technology is the issue of quantum tunneling, where electrons can pass through the very thin barriers within transistors, leading to leakage and power inefficiency. Additionally, the complexity of designing and manufacturing at such a small scale requires advanced lithography techniques, such as Extreme Ultraviolet (EUV) lithography, which are both costly and difficult to implement.
