High Throughput: The continuous nature of the process allows for the rapid production of large-scale nanoscale patterns. Cost Efficiency: Compared to traditional lithography methods, R2R NIL is more cost-effective due to lower material and operational costs. Scalability: The process is easily scalable, making it suitable for mass production. Flexibility: It can be used on various substrate materials, including flexible and rigid substrates. Precision: The method can achieve high-resolution patterns down to the nanoscale.
