Several inorganic resists are commonly used in nanotechnology. Hydrogen silsesquioxane (HSQ) is a popular choice for electron-beam lithography due to its high resolution and excellent etch resistance. Another example is titanium dioxide (TiO2) resists, which are used in photolithography for their high refractive index and UV transparency. Alumina (Al2O3) resists are also used for their robustness and ability to produce fine features.
