Several methods are used for interstitial doping, including:
Chemical Vapor Deposition (CVD): A process where gaseous reactants form a solid material on a substrate, incorporating dopants into the lattice. Ion Implantation: A technique where ions of the dopant are accelerated and embedded into the host material. Hydrothermal Synthesis: A method that involves chemical reactions in aqueous solutions at high temperatures and pressures, allowing dopants to penetrate the lattice.
