In reactive arc evaporation, a high-current electric arc is established between a cathode (the target material) and an anode. The arc generates a localized high temperature, causing the cathode material to vaporize. A reactive gas is introduced into the chamber, reacting with the vaporized material to form a compound. This compound then condenses on the substrate, forming a thin film or nanostructure. The process parameters, such as arc current, substrate temperature, and reactive gas flow, can be finely tuned to control the properties of the deposited film.