Reactive arc evaporation is a type of physical vapor deposition (PVD) technique used to create thin films and nanostructures. The process involves the use of a high-energy electric arc to evaporate a target material, which then reacts with a reactive gas, such as nitrogen or oxygen, to form a compound that deposits on a substrate. This method is particularly effective for producing hard coatings, decorative films, and nanocomposites with precise control over their composition and structure.
