How does Atomic Layer Deposition (ALD) differ from other techniques?
Atomic Layer Deposition (ALD) is a specialized form of CVD that allows for the deposition of thin films with atomic-level precision. The process involves sequentially exposing the substrate to different precursors, creating a single layer of material with each cycle. This technique is crucial for applications requiring ultra-thin, conformal coatings, such as in semiconductors and solar cells.
