How Can We Control Boundaries, Defects, and Interfaces?
Controlling boundaries, defects, and interfaces is a key challenge in nanotechnology. Various strategies are employed to achieve this control. For instance, in the synthesis of nanoparticles, parameters such as temperature, pressure, and precursor concentration can be tuned to control the size, shape, and defect density. In thin film deposition, techniques like chemical vapor deposition (CVD) and atomic layer deposition (ALD) allow precise control over layer thickness and interface quality. Additionally, post-synthesis treatments such as annealing can be used to modify boundaries and reduce defect densities.
