Achieving precision and uniformity involves several advanced techniques and tools. Atomic Force Microscopy (AFM) and Scanning Tunneling Microscopy (STM) are used to manipulate atoms and molecules with atomic-level accuracy. Lithography techniques, such as Electron Beam Lithography (EBL), enable the creation of highly precise nanostructures. Additionally, self-assembly processes are employed to produce uniform nanoparticles and nanostructures by leveraging the natural tendencies of materials to form ordered structures.
