The creation of microfabricated devices involves several key steps:
1. Photolithography: This process uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. 2. Etching: Following photolithography, etching techniques such as reactive ion etching (RIE) are used to remove material from the substrate, shaping it into the desired structure. 3. Deposition: Methods like chemical vapor deposition (CVD) and physical vapor deposition (PVD) are employed to add thin films of materials onto the substrate. 4. Doping: Adding impurities to the substrate to alter its electrical properties is vital for semiconductor device fabrication.
