Are There Any Challenges in Controlling Residual Gas?
Despite advancements in vacuum technology, controlling residual gas remains challenging. Some of the difficulties include:
Material Outgassing: Many materials used in vacuum systems and nanodevices inherently release gases over time. Complex Chamber Designs: Intricate designs can have hidden areas that are difficult to evacuate completely. Dynamic Processes: During certain processes like chemical vapor deposition (CVD), new gases are introduced, complicating the control of residual gas.
