The use of plasma in ALD offers several advantages:
Enhanced Reactivity: Plasma provides the necessary energy to drive reactions at lower temperatures, making it possible to deposit high-quality films on thermally sensitive substrates. Improved Film Quality: Plasma can improve the density and uniformity of the deposited films, leading to better electrical and mechanical properties. Wider Material Range: The reactive species generated in the plasma phase can enable the deposition of materials that are difficult to achieve using thermal ALD.
