Why is Microwave Plasma Preferred in Nanotechnology?
Microwave plasma offers several advantages that make it particularly suitable for nanotechnology applications:
High Density: The plasma generated is highly dense, which improves the efficiency of processes like etching and deposition. Low Temperature: Unlike other types of plasma, microwave plasma can operate at relatively low temperatures, minimizing thermal damage to nanoscale materials. Uniformity: It provides a uniform plasma distribution, which is crucial for consistent treatment of nanomaterials. Scalability: The technology can be easily scaled for industrial applications, making it versatile for both research and commercial production.
