The beam profile significantly influences the resolution, accuracy, and efficiency of nanotechnological processes. For instance, in electron beam lithography (EBL), a well-defined beam profile ensures that patterns can be written with high precision, down to the nanometer scale. Similarly, in focused ion beam (FIB) systems, the beam profile affects the material removal rates and the quality of the microstructures created. In nanoscale imaging, a well-characterized beam profile enhances image clarity and detail.
