Several techniques are employed in nanofabrication, each with its advantages and challenges. Some of the key methods include:
Electron Beam Lithography (EBL): Utilizes focused beams of electrons to create patterns with nanometer precision. Photolithography: Uses light to transfer geometric patterns onto a substrate, commonly used in semiconductor manufacturing. Atomic Layer Deposition (ALD): Deposits thin films one atomic layer at a time, ensuring high precision and uniformity. Nanoimprint Lithography (NIL): Employs a mold to imprint nanoscale patterns onto a substrate. Focused Ion Beam (FIB): Uses ions to etch or deposit materials with high precision.
