Several techniques are employed for mask repair, and nanotechnology plays a pivotal role in many of them:
1. Focused Ion Beam (FIB): This technique uses a focused beam of ions to remove or deposit material on the mask, repairing defects with sub-nanometer precision. 2. Electron Beam Lithography (EBL): EBL uses a focused beam of electrons to draw patterns on a resist-covered substrate. It can be used to add or remove material from the mask. 3. Atomic Force Microscopy (AFM): AFM can be used to manipulate atoms and molecules on the mask surface, allowing for precise repair of defects.
