What Techniques Are Used for Precision Fabrication?
Various advanced techniques are employed to achieve precision in nanotechnology fabrication:
1. Photolithography: Widely used in the semiconductor industry, this technique uses light to transfer a pattern from a mask to a photosensitive chemical called a photoresist.
2. Electron Beam Lithography (EBL): Utilizes a focused beam of electrons to create extremely fine patterns. It offers higher resolution than photolithography but is slower and more expensive.
3. Atomic Layer Deposition (ALD): A thin film deposition technique that allows for atomic-level control over film thickness and composition.
4. Molecular Beam Epitaxy (MBE): Used to fabricate high-quality crystalline materials by depositing atomic layers with precise control over composition and thickness.
5. Nanoimprint Lithography (NIL): A low-cost, high-throughput technique for creating nanoscale patterns by mechanically deforming an imprint resist.
