The future of nanoscale patterning looks promising as ongoing research and development aim to overcome current challenges. Innovations in Directed Self-Assembly (DSA) and advancements in Extreme Ultraviolet Lithography (EUVL) are expected to play a critical role in enhancing the capabilities and applications of nanoscale patterns. Additionally, interdisciplinary collaborations between physicists, chemists, biologists, and engineers are likely to drive new breakthroughs and expand the potential of nanoscale technologies.
