Creating nanoscale patterns involves several techniques, each with its advantages and limitations. Some of the common methods include:
Electron Beam Lithography (EBL): This method uses a focused beam of electrons to draw patterns with high precision on a substrate. Nanoimprint Lithography (NIL): NIL involves pressing a mold with nanoscale features into a polymer substrate to transfer the pattern. Self-Assembly: This technique relies on the natural organization of molecules into ordered structures without external guidance. Atomic Force Microscopy (AFM): AFM can be used to manipulate atoms and molecules to create patterns at the nanoscale.
