Resist material, also known simply as "resist," is a crucial component in the field of nanotechnology, particularly in lithography processes. Resists are typically organic polymers that are sensitive to various forms of radiation, such as ultraviolet light, electron beams, and X-rays. They serve as a protective layer that either enables or inhibits the transfer of patterns onto a substrate, such as silicon wafers, during the fabrication of nanoscale devices.
