What is High Power Impulse Magnetron Sputtering (HiPIMS)?
High Power Impulse Magnetron Sputtering (HiPIMS) is an advanced physical vapor deposition (PVD) technique used to create thin films and coatings with superior properties. HiPIMS operates by delivering high-power pulses to a magnetron target, which results in a high degree of ionization of the sputtered material, enabling the deposition of dense and uniform thin films.
