Several methods are employed to clean nanodevices effectively:
Ultrasonic Cleaning: Uses high-frequency sound waves to agitate a liquid, creating cavitation bubbles that remove contaminants. Plasma Cleaning: Utilizes ionized gas (plasma) to remove organic residues and other contaminants from the surface of nanodevices. Chemical Cleaning: Involves the use of solvents and chemical agents to dissolve and remove contaminants. UV/Ozone Cleaning: Uses ultraviolet light and ozone to break down organic contaminants.
