Several types of top down lithography are prevalent in nanotechnology:
1. Photolithography: Uses light to transfer the pattern onto the resist. It is widely used in semiconductor manufacturing. 2. Electron Beam Lithography: Utilizes a focused beam of electrons for patterning, offering higher resolution than photolithography. 3. Ion Beam Lithography: Similar to electron beam lithography but uses ions, allowing for even finer patterning. 4. Nanoimprint Lithography: Involves pressing a mold into a resist to create patterns, offering a cost-effective alternative for certain applications.
