What are the Main Techniques Used in Nanofabrication?
Several techniques are employed in nanofabrication, each with its own advantages and limitations. Some of the most widely used methods include:
Photolithography: This technique uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. It is widely used in the semiconductor industry for fabricating integrated circuits. Electron-Beam Lithography (EBL): EBL employs a focused beam of electrons to create extremely fine patterns. It offers higher resolution than photolithography but is generally slower and more expensive. Nanoimprint Lithography (NIL): NIL involves mechanically deforming a resist using a mold to create nanoscale patterns. It is a cost-effective method for high-throughput production. Self-Assembly: This technique leverages the natural tendency of molecules to organize into structured patterns. It is particularly useful for creating complex nanostructures without the need for advanced equipment. Atomic Layer Deposition (ALD): ALD is a thin film deposition technique that allows for precise control over film thickness and composition at the atomic level.
