What Are the Main Techniques Used in Nano-Fabrication of ICs?
Several techniques are employed in the nano-fabrication of integrated circuits, including:
1. Photolithography: This process uses light to transfer geometric patterns onto a substrate, allowing the creation of intricate circuit designs at the nanoscale. 2. Electron Beam Lithography (EBL): Utilizes a focused beam of electrons to create extremely fine patterns, offering higher resolution than photolithography. 3. Atomic Layer Deposition (ALD): A thin-film deposition technique that allows for precise control over film thickness and composition. 4. Molecular Self-Assembly: A bottom-up approach where molecules spontaneously form well-defined structures, useful for creating nanoscale components.
