Several techniques are employed in nanofabrication, each with its own advantages and limitations:
Photolithography This is one of the most common techniques used to create patterns on a substrate. It involves using light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. Photolithography is widely used in the semiconductor industry for the fabrication of integrated circuits.
Electron Beam Lithography (EBL) Electron Beam Lithography uses a focused beam of electrons to draw custom patterns on a surface covered with an electron-sensitive film. This technique offers high resolution and is capable of creating extremely small features, making it ideal for research and development applications.
Atomic Layer Deposition (ALD) ALD is a thin film deposition technique that uses sequential, self-limiting chemical reactions to deposit materials one atomic layer at a time. This allows for precise control over film thickness and composition, making it useful for applications requiring high uniformity and conformity, such as coating complex 3D structures.
Nanoimprint Lithography (NIL) Nanoimprint Lithography is a method of fabricating nanometer-scale patterns by mechanically deforming a resist layer with a stamp. It is a cost-effective technique that can produce high-resolution patterns over large areas, and is often used for mass production of nanostructures.
