Several techniques are commonly used in adaptive etching, including:
Reactive Ion Etching (RIE): This technique uses a plasma of reactive gases to etch material anisotropically, providing high precision in the etching process. Plasma Etching: Involves the use of plasma to remove material isotropically or anisotropically. It is often used for etching polymers and other materials. Wet Chemical Etching: Utilizes chemical solutions to selectively dissolve materials. It can be highly selective but less precise compared to dry etching methods.
