Several nanotechnology techniques are pivotal in the fabrication of integrated circuits:
Photolithography - A process used to transfer geometric patterns to a substrate. At the nanoscale, advanced photolithography techniques, such as EUV (Extreme Ultraviolet Lithography), are employed. Electron Beam Lithography - Utilizes a focused beam of electrons to create extremely small patterns necessary for modern ICs. Atomic Layer Deposition - A method for depositing thin films one atomic layer at a time, ensuring precision and uniformity at the nanoscale.
