Photolithography Photolithography is a widely-used technique that employs ultraviolet light to transfer geometric patterns from a photomask to a light-sensitive chemical photoresist on the substrate. This method is essential for the fabrication of integrated circuits and microelectromechanical systems (MEMS).
Electron Beam Lithography (EBL) Electron Beam Lithography (EBL) uses a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film. EBL is capable of achieving resolutions less than 10 nm, making it suitable for research and prototype development.
Atomic Layer Deposition (ALD) Atomic Layer Deposition (ALD) is a type of chemical vapor deposition that deposits materials one atomic layer at a time. This technique is highly precise and is used for coating substrates with thin films of various materials, including oxides, nitrides, and metals.
Self-Assembly Self-assembly methods exploit the spontaneous organization of molecules into structured arrangements. Techniques such as block copolymer lithography and DNA origami fall under this category. These methods are often used to create complex structures with high precision and low cost.
