Several methods are utilized in MEMS fabrication, each offering unique advantages. The most common techniques include:
Photolithography: This process involves transferring a pattern from a photomask to a substrate using light exposure. Etching: Etching removes material from the substrate to create the desired structures. Both wet and dry etching methods are used. Deposition: Techniques like chemical vapor deposition (CVD) and physical vapor deposition (PVD) are employed to deposit thin films of materials. Electroplating: This method is used to deposit metals onto the substrate by passing an electric current through a solution.
