focused ion beam lithography

What are the Future Prospects of FIB Lithography in Nanotechnology?

The future of FIB lithography in nanotechnology is promising, with ongoing research aimed at overcoming its limitations. Advances in ion source technology and beam control are expected to improve the resolution and throughput. Additionally, the integration of FIB with other nanocharacterization techniques could enhance its capabilities in material analysis and device fabrication. As the demand for miniaturized and complex nanodevices continues to grow, FIB lithography is expected to play a crucial role in the development of next-generation technologies.

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