In FIB lithography, a high-energy ion beam is focused onto a substrate. The ions interact with the substrate material, leading to sputtering, implantation, or milling of the material. The process can be finely controlled to achieve high-resolution patterning. The ion source, typically a liquid metal ion source (LMIS), is heated to produce ions that are then accelerated and focused onto the substrate using a series of electromagnetic lenses.
