Several silicon precursors are commonly used in nanotechnology applications:
Silane (SiH4): A gas at room temperature, extensively used in CVD processes to deposit silicon films. Tetraethyl orthosilicate (TEOS): A liquid precursor used in sol-gel processes to create silicon dioxide (SiO2) nanostructures. Silicon Tetrachloride (SiCl4): Typically used in the production of optical fibers and silicon-based nanomaterials.
