What are the Challenges in Developing Next Generation Resists?
The development of next generation resists involves overcoming several challenges, including:
Material Innovation: Finding new materials that can meet the stringent requirements for resolution, sensitivity, and stability. Process Integration: Ensuring that the new resists are compatible with existing and emerging lithography techniques. Cost: Developing cost-effective solutions that can be scaled up for industrial production. Environmental Impact: Minimizing the environmental impact of resist materials and processes.
