What are the Common Techniques in Nanolithography?
Several techniques are employed in nanolithography to achieve high resolution and precision. Some of the most common methods include:
Photolithography
Photolithography uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. While traditionally limited by the wavelength of light, advancements such as extreme ultraviolet (EUV) lithography have pushed the boundaries to smaller dimensions.
Electron Beam Lithography (EBL)
Electron beam lithography employs a focused beam of electrons to draw custom patterns on a surface coated with an electron-sensitive resist. This method offers high resolution down to a few nanometers but is relatively slow and expensive compared to photolithography.
Focused Ion Beam (FIB) Lithography
Focused ion beam lithography uses a focused beam of ions, typically gallium, to directly write patterns on the substrate. FIB is versatile and capable of both milling and depositing materials, making it useful for prototyping and small-scale production.
Nanoimprint Lithography (NIL)
Nanoimprint lithography involves physically pressing a mold with nanoscale features into a thermoplastic or UV-curable resist. This technique is cost-effective and capable of producing very high-resolution patterns over large areas.
