Despite its numerous benefits, nanolithography faces several challenges:
Resolution Limits
Achieving ultra-high resolution while maintaining accuracy and repeatability remains a significant challenge. Techniques like EUV and EBL push the limits, but they come with increased complexity and cost.
Cost
The cost of nanolithography equipment and processes can be prohibitive, especially for methods requiring advanced light sources or high-vacuum environments. This limits its accessibility for smaller research labs and companies.
Throughput
Some nanolithography techniques, such as EBL, have relatively low throughput, making them less suitable for mass production. Improving the speed of these processes without compromising resolution is a key area of research.
