What are the Challenges in Engineering Drain Junctions?
One of the primary challenges is to manage the dopant diffusion and activation during the annealing process. At the nanoscale, even slight deviations can lead to significant performance variations. Another challenge is to mitigate parasitic resistance and capacitance, which can degrade the speed and efficiency of the transistor. Advanced simulation tools and nanofabrication techniques are being developed to address these issues.
