What are the Challenges in Achieving Faster Deposition Rates?
While faster deposition rates offer numerous benefits, they also come with several challenges:
1. Uniformity: Achieving uniform deposition over large areas can be difficult at higher rates. Non-uniform deposition can lead to defects and poor device performance.
2. Adhesion: Faster deposition rates can sometimes compromise the adhesion of the deposited layer to the substrate, leading to peeling or delamination.
3. Quality: Higher rates can introduce impurities or defects into the deposited film, affecting its electrical, optical, or mechanical properties.
