Several alternative methods are being explored to overcome the limitations of photolithography: - Electron Beam Lithography (EBL): Uses an electron beam instead of UV light to achieve higher resolution. - Nanoimprint Lithography (NIL): Involves pressing a mold with nanoscale features into a resist layer to create patterns. - Extreme Ultraviolet Lithography (EUVL): Uses shorter wavelengths to achieve smaller feature sizes. - Directed Self-Assembly (DSA): Utilizes the self-assembling properties of materials to form nanoscale patterns.
