SALD offers several unique advantages over conventional ALD:
High Throughput: Because the process is continuous, SALD can achieve higher throughput compared to time-based ALD. Scalability: The continuous nature of the process makes it easily scalable to industrial levels. Uniformity: SALD ensures excellent film uniformity and thickness control, critical for applications in nanotechnology. Low Temperature: SALD can be performed at relatively low temperatures, making it suitable for temperature-sensitive substrates.
