PVD offers several advantages, making it a preferred method for nanotechnology applications:
High Purity: The vacuum environment used in PVD minimizes contamination, resulting in high-purity thin films. Uniformity: PVD can produce highly uniform coatings over large areas, which is essential for consistent nanomaterial properties. Adhesion: The films produced by PVD typically exhibit strong adhesion to the substrate. Versatility: PVD can be used to deposit a wide range of materials, including metals, ceramics, and composites.
