PVD processes generally involve three key steps: evaporation, transportation, and condensation. There are several methods to achieve these steps, including thermal evaporation, electron beam evaporation, and sputtering.
Thermal Evaporation: The target material is heated until it vaporizes, often using resistive heating or an electron beam. Electron Beam Evaporation: An electron beam is directed at the target material to vaporize it. Sputtering: High-energy ions are used to eject atoms from the target material, which then deposit onto the substrate.
