What are the advantages of PECVD over other deposition methods?
PECVD offers several advantages over other deposition methods:
Lower Temperature Processing: The plasma energy allows for deposition at lower temperatures, making it suitable for temperature-sensitive substrates. High Quality Films: PECVD produces films with excellent uniformity, density, and adhesion. Versatility: It can deposit a wide range of materials, including oxides, nitrides, and polymers. Scalability: PECVD processes can be scaled up for mass production.
