Characterization of deposited films is essential to understand their properties and performance. Common techniques include:
Scanning Electron Microscopy (SEM): Provides high-resolution images of the film surface. Atomic Force Microscopy (AFM): Measures surface roughness and morphology at the nanoscale. X-ray Diffraction (XRD): Determines the crystalline structure of the deposited material. Ellipsometry: Measures film thickness and optical properties. Energy Dispersive X-ray Spectroscopy (EDX): Analyzes the elemental composition of the film.
