There are several techniques to achieve atomic level smoothness:
Chemical Mechanical Polishing (CMP): This technique combines chemical and mechanical processes to smoothen surfaces. Atomic Layer Deposition (ALD): A thin film deposition technique that allows for precise control of film thickness and composition at the atomic level. Molecular Beam Epitaxy (MBE): A method for growing crystalline layers to create extremely smooth surfaces. Ion Beam Sputtering: A process that utilizes ionized particles to smooth out surface irregularities.
