Mold Preparation: A mold with the desired nanoscale pattern is fabricated, often using electron beam lithography. Resist Coating: A UV-sensitive resist is applied to the substrate. Imprinting: The mold is pressed into the resist, creating a physical imprint. UV Exposure: The assembly is exposed to UV light, curing the resist and solidifying the pattern. Mold Removal: The mold is carefully removed, leaving the patterned resist on the substrate.
