thermal cvd

How Does Thermal CVD Work?

In thermal CVD, the substrate is heated to a high temperature, typically between 500°C and 1200°C. Gaseous precursors are introduced into the reaction chamber, where they undergo chemical reactions upon contacting the hot substrate. The key steps include:
Transport of reactant gases to the substrate surface.
Adsorption of reactants onto the substrate.
Surface reactions producing the desired film.
Desorption of by-products from the surface.

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