magnetron sputtering sources

How Does Magnetron Sputtering Work?

The process begins with the introduction of a working gas, usually argon, into a vacuum chamber. A magnetic field is applied to trap electrons near the target surface, increasing the ionization rate of the gas. This creates a high-density plasma. The ions from this plasma bombard the target material, causing atoms to be ejected. These atoms then travel through the chamber and deposit onto the substrate, forming a thin film.

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